ECE 510
ECE 510 - Micro and Nanolithography
Summer 2020
Subject Area
Microelectronics and Photonics
Course Director
Description
This course provides a comprehensive foundation in the broad field of micro/nanolithography for graduate students in varied research areas. Lithography is the central process technology used in fabrication of a vast array of micro/nano structures required in microelectronic devices, displays, flexible electronics, microelectromechanical systems, and biotechnology. The course covers the science of microlithography, including optical imaging, photochemistry, and materials issues; the extensive technological developments, including state-of-the-art commercial lithography systems; and the innumerable applications of lithography in diverse fields.
Topics
- Evolution of microelectronic devices; critical role of lithography.
- Fundamental elements and attributes of microlithographic processes.
- Types of microlithography; optical, e-beam, X-ray, EUV, nanoimprint.
- Excimer lasers as dominant sources for lithography. Key features.
- Optical projection lithography. Primary concepts. Steppers and scanners.
- Lithography on flexible substrates. Roll-to-roll lithography.
- Photoresists. Main constituents and functions. Performance parameters.
- Resolution enhancement techniques. Phase shift masks. Immersion lithography.
- Maskless lithography. Spatial light modulators. Biotechnology applications.
- Electron-beam lithography. Electron Sources. Resists. Exposure concepts.
- X-ray lithography. X-ray sources, synchrotron. Masks. Resists. Applications.
- Extreme ultraviolet (EUV) lithography. Sources, masks, resists Challenges.
- Nanoimprint lithography. Basic concepts. Limitations. Applications.
- UV laser photoablation. Photochemistry. Ablation systems. Key applications.
Detailed Description and Outline
Topics:
- Evolution of microelectronic devices; critical role of lithography.
- Fundamental elements and attributes of microlithographic processes.
- Types of microlithography; optical, e-beam, X-ray, EUV, nanoimprint.
- Excimer lasers as dominant sources for lithography. Key features.
- Optical projection lithography. Primary concepts. Steppers and scanners.
- Lithography on flexible substrates. Roll-to-roll lithography.
- Photoresists. Main constituents and functions. Performance parameters.
- Resolution enhancement techniques. Phase shift masks. Immersion lithography.
- Maskless lithography. Spatial light modulators. Biotechnology applications.
- Electron-beam lithography. Electron Sources. Resists. Exposure concepts.
- X-ray lithography. X-ray sources, synchrotron. Masks. Resists. Applications.
- Extreme ultraviolet (EUV) lithography. Sources, masks, resists Challenges.
- Nanoimprint lithography. Basic concepts. Limitations. Applications.
- UV laser photoablation. Photochemistry. Ablation systems. Key applications.
Texts
Chapters from several books, numerous journal articles, proceedings of conferences, and industry reports
Last updated
2/13/2013