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ECE 498 LG -

Summer 2020

Official Description

Subject offerings of new and developing areas of knowledge in electrical and computer engineering intended to augment the existing curriculum. See Class Schedule or departmental course information for topics and prerequisites. Course Information: 0 to 4 undergraduate hours. 0 to 4 graduate hours. May be repeated in the same or separate terms if topics vary.

Course Director

Topical Prerequisites

ECE 350


Geary, Joseph M. Introduction to lens design: with practical ZEMAX examples. Richmond: Willmann-Bell, 2002.


Greivenkamp, John E. Field guide to geometrical optics. Vol. 1. Bellingham, Washington: SPIE Press, 2004.

Fischer, Robert Edward, et al. Optical system design. New York: McGraw Hill, 2000.

Barrett, Harrison H., and Kyle J. Myers. Foundations of image science. John Wiley & Sons, 2013.

Tkaczyk, Tomasz S. "Field guide to microscopy." SPIE, 2010.

Liang, Rongguang. Optical design for biomedical imaging. Spie Press, 2010.

Course Goals

This course is a comprehensive introduction to the optical design of lenses and imaging systems. This course begins with a review of basic optics, including geometrical optics and Fourier optics. A discussion of how different system specifications influence the choice of design form, achievable performance, and cost will be presented. Aberration theory, stop shift theory, and induced aberrations are examined in detail. Factors that affect aberrations and the principles of aberration correction are discussed. Demonstrations of computer-aided lens design are given accompanied by a discussion of optimization theory, variables and constraints, and local vs. global optimization. Techniques for improving an optical design are illustrated with easy-to-understand Zemax examples.

Instructional Objectives

First-order optics

Understand the concepts of first-order optical design, chief and marginal rays, pupil and stop, throughput method, optical invariant, and vignetting. (1,2)

Comprehend the knowledge of paraxial ray tracing (1,2)

Able to perform paraxial ray tracing using YNU table (2,6).

Able to perform first-order calculations using the Gaussian conjugate method (1,2,6)

Seidel Aberrations

Understand the concepts of Seidel aberrations (1,2)

Understand the wavefront aberration function and its polynomial expansion (1,2)

Comprehend the aberration-correction techniques and understand their underlying principles

Know the applicability of lens bending, lens splitting, stop shift, and stop symmetry for a given Seidel aberration (1,2,6,7)

Learn how to use the computer-aided software Zemax to diagnose the Seidel aberrations in an optical imaging system (1,2,4,6,7)

Chromatic aberrations

Understand the concepts of Abbe number, partial dispersion, primary colors, and secondary colors (1,2)

Know the achromatic doublet and understand why it can correct for the axial chromatic aberration of primary colors. (1,2,6)

Know the apochromatic triplet and understand why it can correct for the axial chromatic aberration of secondary colors. (1,2,6)

Learn how to use the computer-aided software Zemax to diagnose the chromatic aberrations in an optical imaging system (1,2,4,6,7)

Design forms and process

Understand the importance of design forms (1)

Know the process for performing the optical design of an imaging system (1,2,6)

Appreciate the distribution of optical powers in determining the quality of an optical design (1)

Learn how to apply design forms in Cooke triplets and double Gauss (2,6).

Learn how to use the local and global optimization toolbox in Zemax (1,2,4,6,7)

Tolerance analysis

Know the fabrication error types (1)

Know the process of tolerance analysis (1)

Learn how to use the tolerance analysis toolbox in Zemax (2,6)

Learn how to communicate with optomechanical technicians during the design process (3,4,5,7)

Last updated

7/20/2018by James Andrew Hutchinson